| 摘要 |
PURPOSE:To obtain a pattern inspecting device having high detection sensitivity by simplifying the developing process of a hologram recording material and, at the same time, eliminating the need of resetting the hologram recording material. CONSTITUTION:This pattern inspecting device 1 inspects a pattern having a periodic structure on a semiconductor wafer 2 by recording the image of the pattern on the wafer 2 on a hologram recording material and observing the hologram image of the pattern after reproducing the hologram image. A thermoplastic substrate 7 is used as the hologram recording material and the hologram image of the pattern is reproduced by developing the substrate 7 while the substrate 7 is fixed in the same state as that the substrate 7 is fixed at the recording time. |
