发明名称 |
NEGATIVE-WORKING RADIATION-SENSITIVE MIXTURE AND RADIATION-SENSITIVE RECORDING MATERIAL PRODUCED THEREWITH |
摘要 |
A negative-working radiation-sensitive mixture containing a) a compound which contains at least one -CBr3 group bound to an atom not linked in turn to a hydrogen atom, b) an alkoxymethylated melamine and c) a water-insoluble polymeric binder which is soluble, or at least swellable, in aqueous alkaline solutions and contains phenolic OH groups, wherein (1) the mixture has an absorption of < 0.4 .mu.m-1 at 248 nm, (2) the CBr3 group of the compound a) is bound to the sulfur atom of a sulfonyl group and the compound a) is contained in the mixture in an amount of 0.2 to 10% by weight, based on the total amount of the components b) and c), (3) the ratio by mass of the components b) and c) is between 50 : 50 and 5 : 95 and (4) the component c) is a homopolymer or copolymer of hydroxystyrene or a derivative thereof, the homopolymer or copolymer having a removal rate of 200 to 3,000 nm/min at 21.degree.C in an aqueous alkaline developer containing 2.38% by weight of tetramethylammonium hydroxide, has excellent properties including high resistance to plasma etching, and outstanding lithographic properties and is useful in recording materials.
|
申请公布号 |
CA2074791(A1) |
申请公布日期 |
1993.01.30 |
申请号 |
CA19922074791 |
申请日期 |
1992.07.28 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
PAWLOWSKI, GEORG;DAMMEL, RALPH;ROESCHERT, HORST;MEIER, WINFRIED;SPIESS, WALTER;PRZYBILLA, KLAUS-JUERGEN |
分类号 |
G03F7/00;C04B41/50;G03F7/029;G03F7/038;H01L21/027;(IPC1-7):G03F7/038 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|