FORMATION OF RESIST PATTERN

摘要

PURPOSE:To improve the sectional shape of the resist patterns of a high- resolution resist. CONSTITUTION:A coating film 3 of an acid generating agent layer is provided on a resist thin film 2 applied on a substrate and after this film is exposed in patterns, the acid generating agent layer 3 is removed and the resist film is developed, by which the crosslinking density in the upper layer part of the resist is increased. The upper part of the resist is thereby prevented from having roundness and narrowed width when the chemical amplification type resist is used. The resist patterns 7 having the high accuracy are thus obtd.