发明名称 |
METHOD AND DEVICE FOR FORMING INSULATING FILM |
摘要 |
<p>PURPOSE:To form the insulating film having high quality and excellent uniformity of film thickness at a low temp. and to eliminate the defect of the insulating film of a nonlinear resistance element for a liquid crystal display and further to obtain a display which does not require a temp. compensation circuit. CONSTITUTION:The constitution consisting in providing a grounding electrode 18 and an electrode 19 for impressing a high-frequency electric power within a vacuum vessel is provided to face each other. A substrate 20 for forming the insulating film is disposed on the electrode 19 for impressing the high-frequency electric power. Gas contg. oxygen or nitrogen is supplied between the electrodes facing each other and a high-frequency discharge is generated, by which the insulating film is formed on the surface of the substrate 20.</p> |
申请公布号 |
JPH0519296(A) |
申请公布日期 |
1993.01.29 |
申请号 |
JP19910172501 |
申请日期 |
1991.07.12 |
申请人 |
MATSUSHITA ELECTRIC IND CO LTD |
发明人 |
MUKAI YUJI;KODERA KOICHI |
分类号 |
G02F1/1333;G02F1/136;G02F1/1368;H01L21/316;H01L21/318;H01L27/12 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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