发明名称 DIELECIRIC GATE TYPE FIELD EFFECT SEMICONDUCTOR DEVICE AND FABRICATION THEREOF
摘要 <p>PURPOSE:To improve the characteristics and reliability of an active type liquid crystal display device, or the like, using a dielectric gate type FET transistor as a drive element for a pixel by forming a dielectric film around a gate electrode, and by using a non-photosensitive semiconductor. CONSTITUTION:A dielectric gate type FET transistor in which the distance between a feeding point of the source regions 5 and 5' and drain regions 6 and 6' and the end of a channel is shortened. In such an FET transistor, semiconductor films 2 and 2' designated for the formation of a source region, a drain region, and a channel region of the dielectric gate type FET transistor contain oxygen, carbon and nitrogen 1X10<20>cm<-3> or more and 20 atomic % or less.</p>
申请公布号 JPH0521794(A) 申请公布日期 1993.01.29
申请号 JP19910035484 申请日期 1991.02.04
申请人 SEMICONDUCTOR ENERGY LAB CO LTD 发明人 YAMAZAKI SHUNPEI;MASE AKIRA
分类号 H01L27/092;G02F1/136;G02F1/1368;H01L21/336;H01L21/8238;H01L27/12;H01L29/78;H01L29/786 主分类号 H01L27/092
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