| 摘要 |
PURPOSE:To allow the efficient inspection of both of the deviation quantity form the prescribed value of the phase transition quantity of the phase member of a phase shift reticle and the microdefects of absorber patterns and phase member patterns with a simple unstitution. CONSTITUTION:An inspecting device 2 for the deviation quantity from the prescribed value of the phase transition quantity of the phase member of the phase shift reticle 5 and an inspecting device 3 for the microdefects of the absorber patterns and phase member patterns are provided adjacent to each other. The phase shift reticle is selectively transported to the inspecting device 2 for the deviation quantity and the inspecting device 3 for the microdefects by moving an X-Y stage and is thereby inspected. |
