发明名称 PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE ELEMENT FORMED BY USING THE COMPOSITION
摘要 PURPOSE:To obtain the compsn. which improves the thick film formability of photosensitive polyimide, has an excellent photosensitivity in spite of using this compsn. as a thick film and maintains the initial photosensitivity without degrading in spite of resting at room temp. over a long period of time by incorporating a specific compd. therein. CONSTITUTION:This compsn. is formed by compounding the 3-ketocumarine compd. expressed by formula I or formula II and the N-aryl-alpha-amino acid compd. expressed by formula III as a photoinitiator and multifunctional acrylate as a crosslinking agent with the photosensitive polyimide introduced with a vinyl group by disintegrating a covalent bond or ion bond. Since the benzene ring of this amino mixture is substd. with an electron-withdrawing group, such as cyano group or acetyl group, the photosensitivity of the compsn. does not degrade even after lapse of a long period of time. In the formulas, R1 to R15, respectively independently denote a hydrogen atom, hydroxy group, alkyl group, etc.; R16 denotes an alkyl group, aryl group, etc. R17 to R21 respectively independently denote a hydrogen atom, cyano group, etc.; R22 denotes a hydrogen atom, alkyl group, etc.; R23, R24 respectively independently denote a hydrogen atom or alkyl group.
申请公布号 JPH0519475(A) 申请公布日期 1993.01.29
申请号 JP19910172343 申请日期 1991.07.12
申请人 HITACHI CHEM CO LTD 发明人 SATO KUNIAKI;KOJIMA YASUNORI;KIKUCHI NOBURU;NISHIZAWA HIROSHI
分类号 G03F7/027;G03F7/031;G03F7/038;H01L21/027;H05K3/28 主分类号 G03F7/027
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