| 摘要 |
PURPOSE:To detect translucent pattern defects of a reticle such as water spots and fur. CONSTITUTION:The pattern images of a reticle 3 are successively projected on a photosensitive resist film 2 by exposure by a step and repeat system while varying exposure energy every shot within the range of 230-260mj/cm<2> and development is carried out. The resulting patterns are compared to each other and pattern defects of the reticle 3 are detected. |
