发明名称 ETCHING SOLUTION FOR POLYIMIDE RESIN
摘要 PURPOSE:To obtain an etching solution with which a cured polyimide resin can be etched safely at a high rate with easiness of handling by mixing water with an aprotic organic solvent compatible with water, a protonic organic solvent compatible with water, and a basic compound. CONSTITUTION:The title solution is obtained by mixing the following four essential ingredients: water, an aprotic organic solvent compatible with water (e.g. methyl ethyl ketone), a protonic organic solvent compatible with water (e.g. methanol), and a basic compound (e.g. sodium hydroxide). By the use of this etching solution which can be handled safely, a completely cured polyimide resin can be etched at an extremely high rate.
申请公布号 JPH0517604(A) 申请公布日期 1993.01.26
申请号 JP19910172719 申请日期 1991.07.12
申请人 NISSAN CHEM IND LTD 发明人 AOKI MASABUMI
分类号 C08J7/02;C08L79/08;C09K13/06;H01L21/308 主分类号 C08J7/02
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