发明名称 |
Insulated gate bipolar transistor and method of manufacturing the same |
摘要 |
In the present invention, baneful influences such as the reduction of the threshold voltage due to the irradiation of an ionizing radiation such as an electron beam and a light ion beam are removed to practice the lifetime control of an IGBT with good controllability. Basically, the lifetime control without change in the threshold voltage is implemented by increasing the threshold voltage on or before irradiating the ionizing radiation so as to cancel the influence of each other. Further, the lifetime control without change in the threshold voltage is implemented with higher accuracy by irradiating a light ion beam from a rear main electrode side so as to cause crystal defects locally in a specific region in an epitaxial layer.
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申请公布号 |
US5182626(A) |
申请公布日期 |
1993.01.26 |
申请号 |
US19900543532 |
申请日期 |
1990.06.26 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
AKIYAMA, HAJIME;KONDOH, HISAO |
分类号 |
H01L21/331;H01L29/08;H01L29/739 |
主分类号 |
H01L21/331 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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