发明名称 |
Deep u.v. photoresist compositions containing 4-tert-butylstyrene/maleimide copolymer and polycyclic cyclopentane-2-diazo-1,3-dione and elements utilizing the compositions |
摘要 |
Photosensitizers containing saturated and unsaturated polycyclic compounds containing the cyclopentane-2-diazo-1,3-dione structural unit. These compounds have their maximum u.v. absorption at around 248 nm, decompose into polar products upon irradiation, and can be used as photosensitizers in positive deep u.v. or excimer laser (248 nm) lithography. They are most preferably useful with deep u.v. transparent resins for forming photoresists.
|
申请公布号 |
US5182185(A) |
申请公布日期 |
1993.01.26 |
申请号 |
US19910693513 |
申请日期 |
1991.04.30 |
申请人 |
HOECHST CELANESE CORPORATION |
发明人 |
WU, CHENGJIU;MOORING, ANNE;YARDLEY, JAMES T. |
分类号 |
C07C245/12;G03F7/016 |
主分类号 |
C07C245/12 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|