发明名称 METHOD AND APPARATUS FOR COOLING SEMICONDUCTOR WAFER
摘要 PURPOSE:To sufficiently cool a wafer while reducing foreign matters to be adhered to a rear surface of the wafer. CONSTITUTION:A wafer 7 is approached to a cooling plate 15 by holding pins 5 group held in a point contact state, and cooling air 14 is blown to the wafer 7 in a near state to cool the wafer. Thus, since the wafer 7 is held in the point contact state, foreign matters to be adhered to the rear surface of the wafer are reduced. Since the wafer 7 is cooled by the plate 15 and the air 14, it is effectively cooled.
申请公布号 JPH0513294(A) 申请公布日期 1993.01.22
申请号 JP19910190788 申请日期 1991.07.04
申请人 HITACHI LTD 发明人 NOMURA HISAFUMI
分类号 H01L21/302;G03F7/20;H01L21/027;H01L21/3065 主分类号 H01L21/302
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