| 摘要 |
PURPOSE:To obtain the resist composition superior in sensitivity and resolution and pattern profile by incorporating an alkali-soluble resin and a specified phenol quinonediazidosulfonate. CONSTITUTION:The resist composition the alkali-soluble resin and the quinonediazido sulfonic ester of the phenol compound represented by formula I, and this ester is synthesized by condensing this phenol compound of formula I with quinonediazidosulfochloride such as 1,2-benzoquinonediazido-4-sulfochloride in the presence of weak alkali, thus permitting sensitivity and resolution and pattern profile to be enhanced while maintaining various properties, such as film remainder rate and heat resistance. |
