| 摘要 |
PURPOSE:To make modifications to a written pattern rapidly without increasing the time required for calculations or the amount of data when the written pattern is required to be modified, etc., by conducting a processing such as resizing, scaling, black-white inversion or mirroring inside a pattern lithography equipment as required. CONSTITUTION:A control computer 8 reads the pattern data which corresponds to a pattern to be written from a data disk 9, transferring it to a pattern data memory 10a or 10b. When the pattern data is required to be modified, the pattern data is stored in a first memory 15 of a processing device A through a judging section 24. Then, the pattern data is subjected to a resizing process at a resizing process rotation 16 and as a result, the pattern is enlarged or reduced. After the pattern data is subjected to an outlining process at an outlining process circuit 18, a scaling process at a scaling process circuit 19 and a black-white process at a black-white inversion process circuit 22 or other processes, it is stored in a second memory 22. If necessary, the pattern is depicted. |
