发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain the positive type photosensitive composition high in sensitivity and superior in resolution. CONSTITUTION:This composition contains a polymer compound having repeating units each having 1, 2-naphthoquinone-2-diazido-4-or/and-5-sulfonyl group represented by formula I in an amount of at least 1mol%. In formula I, D is 1,2-naphthoquinon-2-diazido-4-yl group or 1, 2-napluthoquinon-2-diazido-5-yl; A is H or alkyl; B is a simple bond, a divalent aromatic bonding group, -CO-O-R<1>-, or -CO-NR<2>-R<1>-; R<1> is a divalent aliphatic or aromatic hydrocarbon group; R<2> is H, alkyl, aryl, or aralkyl; and n is an integer of >=1.
申请公布号 JPH0511444(A) 申请公布日期 1993.01.22
申请号 JP19910007178 申请日期 1991.01.24
申请人 FUJI PHOTO FILM CO LTD 发明人 AOSO TOSHIAKI;MIZUTANI KAZUYOSHI
分类号 G03F7/023;H01L21/027 主分类号 G03F7/023
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