CLEANING METHOD FOR SURFACE OF SILICON,申请号JP19910184197-传众专利搜索

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发明名称	CLEANING METHOD FOR SURFACE OF SILICON
摘要
申请公布号	JPH0513387(A)	申请公布日期	1993.01.22
申请号	JP19910184197	申请日期	1991.06.28
申请人	NEC CORP	发明人	HIROI MASAYUKI
分类号	H01L21/302;H01L21/304	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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