| 摘要 |
The solar cell is mfd. by (a) covering an indium tin oxide (10) of 500-1000 angstroms on the glass substrate (1) by the electron beam deposition method or sputtering method, (b) depositing a silicon oxide (9) of 1000-5000 angstroms by the PECVD method, (c) depositing a silicon oxide (8) of 500-5000 angstroms to form a pattern, (d) depositing an amorphous silicon layer (7) to form a anode of the solar cell, and (e) depositing a metal (Al or Cr) of 0.5-1 mm as a cathode of the cell by the electron beam deposition method or sputtering method. The solar cell has a high energy conversion efficiency.
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