CONTINUOUS VACUUM ARC BROAD BEAM ION SOURCE

摘要

A continuous high current electrically conductive solid ion source (10) is described that allows the production of an ion beam of unprecedented size and power. This inventive apparatus (10) and process provides for the possibility of industrial scale ion implantation of surfaces (22). Highly specialized components (32, 46, 102) are provided in a tailored configuration, allowing long-term continuous function and very high power levels. Ions are extracted from a continuous plasma beam. The inventive apparatus also provides for fine modulation of ion beam density and current during the operation of the apparatus (10).