VORRICHTUNG ZUR ERZEUGUNG KURZER TEILCHENSTRAHLPULSE

摘要

The device described comprises means for generating a continuous beam of particles, in particular electrons, a shutter for the particle beam and an electrode assembly located in front of the shutter. The electrode assembly has at least two parallel electrically conducting lines and generates an electrical field which acts on the particle beam. This field changes to produce a high rate of change in the angle of deflection of the beam with respect to the shutter location as a function of the time of arrival of the particles.