| 摘要 |
PURPOSE:To provide the pellicle for lithography which has good air permeability, can eliminates the differential pressure between the inside and outside and is increased in the rate of prohibiting the infiltration of particles into the pellicle. CONSTITUTION:This pellicle for lithography is provided with an aperture in a part of a pellicle frame for mounting the pellicle and this aperture is coated with a filter for removing particles. |
