发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 A photopolymerizable composition comprising (A) an addition-polymerizable compound having an ethylenically unsaturated double bond (B) a compound of the formula: <CHEM> [wherein R<1> is a substituted or nonsubstituted phenyl group, R<2> and R<3> are the same or different and indicate a hydrogen atom or a C1-4 alkyl group, R<4> is an alkylene group which may have at least one sort of a substituent selected from alkyl, hydroxyl and oxo (=O) on a main chain, or which may contain at least one sort selected from an oxygen atom and a cycloalkylene group in a main chain, R<5> is a hydrogen atom or a methyl group, and a and b are independently 0 or 1], (C) a light absorbing compound, and (D) a film-forming polymer having alkaline solubility or alkaline swelling characteristic is disclosed. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition. <IMAGE>
申请公布号 AU1956292(A) 申请公布日期 1993.01.14
申请号 AU19920019562 申请日期 1992.07.10
申请人 NIPPON PAINT CO., LTD. 发明人 SEIJI ARIMATSU;TAKAKAZU HASE;YOSHIFUMI ICHINOSE
分类号 G03F7/00;C08F2/50;G03F7/004;G03F7/027;G03F7/029;G03F7/031;G03F7/033;H01L21/027;H01L21/30 主分类号 G03F7/00
代理机构 代理人
主权项
地址