发明名称 LATERAL-POSITION MEASURING DEVICE IN PROXIMITY LITHOGRAPHIC SYSTEM AND METHOD THEREOF
摘要 <p>PURPOSE: To provide an optimum signal which is exactly corresponding to the lateral position of mask on a recording plane by practically moving in parallel a silicon wafer, according to the measured values of two detectors processed by a microprocessor for preparing an arrange signal corresponding to a piezoelectric device. CONSTITUTION: A wafer is quantitatively moved little by little by a piezoelectric device 26 or a stepping motor in a direction practically parallel to a hologram lattice direction within the range smaller than a lattice interval and for achieving resist adjustment in that direction. After the end of a movement, it is read by detectors 22 and 24 and stored in the memory of a microprocessor 28. When two lattices are properly put in order, because of symmetricity, the strength of two dimensions of two detectors becomes equal. Therefore, two read values stored in the microprocessor 28 are substracted, and an arranging position is determined. Thus, the lateral position of mask on the recording plane can be provided exactly.</p>
申请公布号 JPH056853(A) 申请公布日期 1993.01.14
申请号 JP19910263815 申请日期 1991.10.11
申请人 HORUTORONITSUKU TECHNOL LTD 发明人 FURANSHISU SUTEISU MAARII KURABU
分类号 G03F1/08;G03F9/00;G03H1/00;H01L21/027 主分类号 G03F1/08
代理机构 代理人
主权项
地址