PRODUCTION OF GRAPHITE INTERCALATION COMPOUND AND DOPED CARBON FILMS

摘要

Disclosed is a method for preparing pyrolytic carbon films with highly ordered graphite structure at relatively low temperature comprising thermal decomposing an organic compounds introduced by a carrier gas into a reaction chamber to deposit the carbon films onto a single-crystalline substrate. The present invention also is to provide a method for preparing graphite intercalation compounds with metal or metal compounds consisting of a simultaneous thermal decomposition of two kinds of starting materials, modified CVD (Chemical vapor deposition) method in which hydrocarbon as a source material for the host graphite and other organometal reagents or metal halides for guest metal species or metal compound are decomposed at a same time in a reactor in order to intercalate the metal species or metal compound into carbon being depositing on the substrate. Further, the present invention is to provide a doped carbon film which is capable of P-type or N-type according to kinds of dopant species obtained by partial substitution of dopants for carbon atoms which constitute graphite hexagonal net layer during the growth of carbon films, through simultaneous thermal decomposition of two kinds of source materials for carbon films and for dopant to be substituted.