发明名称 PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE
摘要 A photopolymerizable composition comprising (A) an addition-polymerizable compound having an ethylenically unsaturated double bond (B) a compound of the formula: ¢I! ¢wherein R1 is substituted or nonsubstituted phenyl group, R2 and R3 are the same or different and indicate a hydrogen atom or a C1-4 alkyl group, R4 is an alkylene group which may have at least one sort of a substituent selected from alkyl, hydroxyl and oxo (=O) on a main chain, or which may contain at least one sort selected from an oxygen atom and a cycloalkylene group in a main chain, R5 is a hydrogen atom or a methyl group, and a and b are independently 0 or 1!, (C) a light absorbing compound, and (D) a film-forming polymer having alkaline solubility or alkaline swelling characteristic is disclosed. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition.
申请公布号 CA2073494(A1) 申请公布日期 1993.01.12
申请号 CA19922073494 申请日期 1992.07.08
申请人 ARIMATSU, SEIJI;HASE, TAKAKAZU;ICHINOSE, YOSHIFUMI 发明人 ARIMATSU, SEIJI;HASE, TAKAKAZU;ICHINOSE, YOSHIFUMI
分类号 G03F7/00;C08F2/50;G03F7/004;G03F7/027;G03F7/029;G03F7/031;G03F7/033;H01L21/027;H01L21/30;(IPC1-7):G03F7/032 主分类号 G03F7/00
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