发明名称 |
PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PRINTING PLATE |
摘要 |
A photopolymerizable composition comprising (A) an addition-polymerizable compound having an ethylenically unsaturated double bond (B) a compound of the formula: ¢I! ¢wherein R1 is substituted or nonsubstituted phenyl group, R2 and R3 are the same or different and indicate a hydrogen atom or a C1-4 alkyl group, R4 is an alkylene group which may have at least one sort of a substituent selected from alkyl, hydroxyl and oxo (=O) on a main chain, or which may contain at least one sort selected from an oxygen atom and a cycloalkylene group in a main chain, R5 is a hydrogen atom or a methyl group, and a and b are independently 0 or 1!, (C) a light absorbing compound, and (D) a film-forming polymer having alkaline solubility or alkaline swelling characteristic is disclosed. There is also disclosed a photosensitive lithographic printing plate comprising the photopolymerizable composition.
|
申请公布号 |
CA2073494(A1) |
申请公布日期 |
1993.01.12 |
申请号 |
CA19922073494 |
申请日期 |
1992.07.08 |
申请人 |
ARIMATSU, SEIJI;HASE, TAKAKAZU;ICHINOSE, YOSHIFUMI |
发明人 |
ARIMATSU, SEIJI;HASE, TAKAKAZU;ICHINOSE, YOSHIFUMI |
分类号 |
G03F7/00;C08F2/50;G03F7/004;G03F7/027;G03F7/029;G03F7/031;G03F7/033;H01L21/027;H01L21/30;(IPC1-7):G03F7/032 |
主分类号 |
G03F7/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|