| 摘要 |
PURPOSE:To obtain an exposure apparatus, which detects optically a mark of the form of a substrate, such as a wafer, with high accuracy and is capable of aligning the substrate to an exposure position with high accuracy by a method wherein the device is provided with variable gain amplifiers, which adjust a gain to photoelectric signals subjected to photoelectric detection according to the arrangement position of a region to be exposed, and the like. CONSTITUTION:A mark for alignment use annexed to a region to be exposed is subjected to photoelectric detection and the region to be exposed and the mark are relatively aligned to each other by alignment control means on the basis of photoelectric signals subjected to photoelectric detection. Such an exposing device is provided with variable gain amplifiers 81, 83 and 88, which adjust a gain to the photoelectric signals SA to SC in response to a control signal and thereafter, output to the alignment control means 5, 6, 84 to 86, 89, 90, 100 and the like, and a control signal making means 100 formed into such a structure that when the mark is detected by a mark detecting means, the means 100 modifies the value of a control signal to be applied to the amplifiers 81, 83 and 88 according to the arrangement position of the region to be exposed to correspond to the detected mark. |
