PROCESS FOR PLASMA DEPOSITING SILICON NITRIDE AND SILICON DIOXIDE FILMS ONTO A SUBSTRATE,申请号EP19890906620-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	PROCESS FOR PLASMA DEPOSITING SILICON NITRIDE AND SILICON DIOXIDE FILMS ONTO A SUBSTRATE
摘要
申请公布号	EP0417170(B1)	申请公布日期	1993.01.07
申请号	EP19890906620	申请日期	1989.05.22
申请人	OLIN CORPORATION	发明人	DORY, THOMAS, S.
分类号	C23C16/42;C23C16/34;C23C16/40;C23C16/50;C23C16/52	主分类号	C23C16/42
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Method and system for identifying storage devices

Web-based groupware system

Internal limiting membrane rake

Method for managing acquisition lists for wireless local area networks

System and method of controlling power consumption

Preparation of syngas for acetic acid synthesis by partial oxidation of methanol feedstock

Production method for a magnetostrictive torque sensor

Method and system for performing a server-assisted file transfer

Method and system for dynamically adjusting packet size to decrease delays of streaming data transmissions on noisy transmission lines

Proactive delivery of messages behind a network firewall

Markup method for managing rich client code and experiences using multi-component pages

Receiving apparatus, and display apparatus and television broadcasting system therewith

Checking and conditional processing of a print job printed with multiple transfer media

Multilayer decoupling system

Instrument for endoscope and instrument system for endoscope

Style guide and formatting methods for pilot quick reference handbooks

Monitoring VRM-induced memory errors

Data storage using disk drives in accordance with a schedule of operations

Method of client side map rendering with tiled vector data

Use of automotive diagnostics console to diagnose vehicle