发明名称 Low sodium, low metals silica polishing slurries.
摘要 <p>A colloidal silica slurry comprising: a low metals ammonium-stabilized silica sol having the following characteristics: SiO2 present in the range between about 15 to about 50 weight percent; a pH in the range between about 8.5 to about 11.3; a particle diameter in the range between about 4.0 to about 130 nm; aluminum, as Al, present in an amount less than about 100 ppm, based on SiO2; iron, as Fe, present in an amount less than about 50 ppm, based on SiO2; potassium, as K, present in an amount less than about 25 ppm, based on SiO2; and sodium, as Na, present in an amount less than about 500 ppm, based on SiO2; and a bactericide, a polishing rate accelerator which differs from the bactericide, and/or a sodium chlorite or sodium hypochlorite biocide. Optionally, a fungicide may also be added to the colloidal silica slurry to inhibit fungi growth.</p>
申请公布号 EP0520109(A1) 申请公布日期 1992.12.30
申请号 EP19910306014 申请日期 1991.07.02
申请人 NALCO CHEMICAL COMPANY 发明人 ROMBERGER, JOHN A.;PAYNE, CHARLES C.
分类号 C01B33/143;C01B33/148;C09K3/14 主分类号 C01B33/143
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