| 摘要 |
PURPOSE:To keep the development performance of a photoresist development apparatus always constant against the lapse of time. CONSTITUTION:A temperature controller 7 controls the temperature of developer and also controls the temperature of medium flowing through a pipe in a temperature control plate 5 so as to be the same temperature as the temperature of the developer. After the temperature of a multilayer interconnection board 3 is made to be the same as the temperature of the developer by placing the board 3 on the temperature control plate 5, the board 3 is fixed to a rotary mechanism 8 by a conveying arm 4. A developer dropping nozzle 9 drops a certain quantity of the developer whose temperature is controlled by the temperature controller 7 onto the multilayer interconnection board 3 fixed to the rotary mechanism 8 to develope the board 3. |
