Method of manufacturing of an optical structure and optical structure thus obtained.

摘要

The invention relates to the manufacture of an optical structure. On a polymeric substrate 41, are carried out first a surface activation at 42, and the deposition of a 2000 ANGSTROM thick SiO2 layer 43, then the deposition of a plurality of functional layers 44, 44', 44'', and finally a 3 micron thick SiO2 deposition 45 followed by a 3 micron thick Si3N4/SiOxNy deposition (46), the latter under conditions of radio frequency polarisation. The optical structure thus produced has qualities of adherence, of abrasion resistance and of resistance to thermal shocks. <IMAGE>