发明名称 |
SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE AND MANUFACTURE THEREOF |
摘要 |
PURPOSE:To provide a micronized non-volatile memory which can be read out at a high speed and operate at a low voltage. CONSTITUTION:In a non-volatile memory of this design, word lines W0-W2 formed of a first conductive layer 4 provided onto a semiconductor substrate 1 through the intermediary of a gate insulating film 3 and semiconductor regions 8 of certain conductivity opposite to that of the semiconductor substrate 1 provided on the substrate 1 between the word lines W0-W2 are provided. Data lines D0-D2 formed of a second conductive layer 6 provided onto the word lines W0-W2 through the intermediary of insulating films 5a and 5b so as to intersect the word lines W0-W2 are provided, and the lines D0-D2 are connected to the semiconductor regions 8 respectively to constitute the non-volatile memory. |
申请公布号 |
JPH04369864(A) |
申请公布日期 |
1992.12.22 |
申请号 |
JP19910147057 |
申请日期 |
1991.06.19 |
申请人 |
HITACHI LTD |
发明人 |
KURODA KENICHI;TAKEDA TOSHIFUMI;YABUOSHI NORIYUKI |
分类号 |
H01L27/112;H01L21/8246;H01L21/8247;H01L27/115;H01L29/788;H01L29/792 |
主分类号 |
H01L27/112 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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