Process for the vapor deposition of polysilanes photoresists
摘要
Disclosed is a process for forming a film comprising a polysilane composition on a substrate. The film is formed by vapor deposition directly on a substrate, thus avoiding the cumbersome steps ordinarily encountered in preparing and applying polysilanes by conventional spin application techniques. The film is used in a lithographic process for forming an image on a substrate.
申请公布号
US5173452(A)
申请公布日期
1992.12.22
申请号
US19910635819
申请日期
1991.01.02
申请人
DOBUZINSKY, DAVID M.;HAKEY, MARK C.;HOLMES, STEVEN J.;HORAK, DAVID V.
发明人
DOBUZINSKY, DAVID M.;HAKEY, MARK C.;HOLMES, STEVEN J.;HORAK, DAVID V.