发明名称 MANUFACTURING METHOD AND DEVICE FOR SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE:To provide a technique of manufacturing a semiconductor device, where the control of a wafer process can be effectively and accurately carried out without being affected by the surface state of a semiconductor wafer. CONSTITUTION:The discrimination data Wa of a semiconductor wafer, the arrangement data Wx of semiconductor devices X formed on the front side of the semiconductor wafer W, and data such as al-ignment marks M used for drawing patterns and the like are formed on the rear side of the semiconductor wafer W, and then the control of a wafer process is controlled basing on the data formed on the rear side of the wafer for recording.</p>
申请公布号 JPH04369851(A) 申请公布日期 1992.12.22
申请号 JP19910147059 申请日期 1991.06.19
申请人 HITACHI LTD 发明人 OKAMOTO YOSHIHIKO;SUGIMORI HIROYUKI
分类号 H01L21/02;H01L21/68 主分类号 H01L21/02
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