发明名称 POSITIVE RESIST COMPOSITION
摘要 PURPOSE:To improve resolution without deteriorating heat resistance by allowing to contain a solvent essentially consisting of a quinonediazide compound, an alkali soluble resin and a trialkyl ortho-formate. CONSTITUTION:A trialkyl ortho-formate shown in formula I is used as a solvent. In this case, R is alkyl group having carbon number of 1-5 which may be substituted. Moreover, the positive resist composition is allowed to contain solvent essentially consisting of quinonediazide compound, alkali soluble resin and trialkyl ortho-formate. Alkyl group in which R may be substituted may be branched, and a hydroxyl group, halogen atom, such as chlorine atom, etc., as a substituent for alkyl group is preferable.
申请公布号 JPH04368949(A) 申请公布日期 1992.12.21
申请号 JP19910145903 申请日期 1991.06.18
申请人 SUMITOMO CHEM CO LTD 发明人 KAMIYA YASUNORI;DOI YASUYOSHI;HASHIMOTO KAZUHIKO;IDA AYAKO
分类号 G03F7/022;H01L21/027 主分类号 G03F7/022
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