| 摘要 |
PURPOSE:To reduce a pressure which is exerted on a resist film when a developer flows down. CONSTITUTION:A treatment-liquid pipe 5 arranged in the horizontal direction or a tilted plate 8 is brought close to a wafer 4, and a treatment liquid flows down to the face of a resist film on the wafer 4. In addition, many discharge holes 11 are made in the bottom of a treatment-liquid tank 10; a balloon 12 is arranged between the bottom and the top of the tank 10. The discharge holes 11 are opened and shut by the expansion or the contraction of the balloon 12. The treatment liquid flows down, or the meniscus of the treatment liquid is formed in the discharge holes 11 and shifted to the face of the resist film on the wafer 4. |
