发明名称 FORMATION OF COLORED PATTERN
摘要 <p>PURPOSE:To provide the method for forming a colored pattern capable of surely removing the unexposed portion while completely preserving the photo-hardened portion, uniformly developing the large colored pattern, and being performed under relatively wide conditions when the colored pattern is formed with a coloring photosensitive composition material containing photo-hardened resin. CONSTITUTION:A coloring photosensitive solution containing photosensitive resin, a light initiator and a pigment is coated on a base and dried to form the paint film of a colored photosensitive composition material, and the paint film is exposed via a pattern mask to photo-harden the paint film into a pattern shape. The paint film is dipped together with the base into a developing solution containing a solvent dissolving the photosensitive resin, ultrasonic waves 100 KHz or above are applied to the paint film face to remove the unexposed portion for the development operation, and a colored pattern is formed.</p>
申请公布号 JPH04365051(A) 申请公布日期 1992.12.17
申请号 JP19910235312 申请日期 1991.06.11
申请人 UBE IND LTD 发明人 NAKAJIMA KOHEI;NISHIO KAZUAKI;TSUKADA TOSHINORI
分类号 G02B5/20;G03F7/26;G03F7/30 主分类号 G02B5/20
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