POST-TREATMENT OF LIQUID PHASE EPITAXIAL WAFER,申请号JP19910140391-传众专利搜索

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发明名称	POST-TREATMENT OF LIQUID PHASE EPITAXIAL WAFER
摘要
申请公布号	JPH04364721(A)	申请公布日期	1992.12.17
申请号	JP19910140391	申请日期	1991.06.12
申请人	MITSUBISHI RAYON CO LTD	发明人	YONEDA MUNEHISA;ICHIMURA KIYOSHI;TOSHI AKIHITO;AMAKASU SACHIYO
分类号	C30B19/00;H01L21/208	主分类号	C30B19/00
代理机构		代理人
主权项
地址

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