发明名称 APPARATUS FOR CHAMFERING WAFER NOTCH
摘要 <p>PURPOSE:To enable chamfering work easily and surely to a notch, to achieve chamfering work to this notch, and to simplify a constitution. CONSTITUTION:The following are provided: a rotary disc-shaped grindstone 16; a wafer-holding mechanism 14 that holds a wafer 12; a first drive mechanism 15 rotated over a predetermined range of angles around its center axis (in the arrow theta direction); and a second drive mechanism 20 that advances and retreats the wafer 12 in the arrow X direction; and a third drive mechanism 22 that advances and retreats the grindstone 16 in the Z direction. This grindstone 16 has a substrate 52 made of an elastic material and a plurality of grind grains 54 buried in the peripheral face of the substrate 52.</p>
申请公布号 JPH04364729(A) 申请公布日期 1992.12.17
申请号 JP19910167754 申请日期 1991.06.12
申请人 SHIN ETSU HANDOTAI CO LTD 发明人 HOSOKAWA KAORU
分类号 B24B9/00;B24B9/06;H01L21/02;H01L21/304;H01L21/683 主分类号 B24B9/00
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