发明名称 |
APPARATUS FOR CHAMFERING WAFER NOTCH |
摘要 |
<p>PURPOSE:To enable chamfering work easily and surely to a notch, to achieve chamfering work to this notch, and to simplify a constitution. CONSTITUTION:The following are provided: a rotary disc-shaped grindstone 16; a wafer-holding mechanism 14 that holds a wafer 12; a first drive mechanism 15 rotated over a predetermined range of angles around its center axis (in the arrow theta direction); and a second drive mechanism 20 that advances and retreats the wafer 12 in the arrow X direction; and a third drive mechanism 22 that advances and retreats the grindstone 16 in the Z direction. This grindstone 16 has a substrate 52 made of an elastic material and a plurality of grind grains 54 buried in the peripheral face of the substrate 52.</p> |
申请公布号 |
JPH04364729(A) |
申请公布日期 |
1992.12.17 |
申请号 |
JP19910167754 |
申请日期 |
1991.06.12 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
HOSOKAWA KAORU |
分类号 |
B24B9/00;B24B9/06;H01L21/02;H01L21/304;H01L21/683 |
主分类号 |
B24B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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