发明名称 Method and apparatus for liquid-phase epitaxial growth.
摘要 <p>A method and an apparatus capable of efficiently producing an epitaxial layer grown at one time on a multiplicity of substrates with uniform thickness and quality are disclosed, in which a sealable growth chamber (16) filled in a solution (S) used to achieve liquid-phase epitaxial growth and holding therein at least one row of thin plate-like substrate (W) is turned about the horizontal axis. The growth chamber (16) is tilted or overturned so that the solution (S) in the growth chamber (16) is stirred homogeneously and the effect of gravity on the solution (S) is excluded. A solution chamber (14) for holding therein the solution (S) is connected with the growth chamber (16) via a gate valve (18). After the liquid-phase epitaxial growth, the growth chamber (16) is overturned and then the gate valve (18) is opened so that the solution (S) in the growth chamber (16) returns to the solution chamber (14). Thus, reuse of the solution (S) is possible. &lt;IMAGE&gt;</p>
申请公布号 EP0518332(A1) 申请公布日期 1992.12.16
申请号 EP19920109855 申请日期 1992.06.11
申请人 SHIN-ETSU HANDOTAI COMPANY, LIMITED 发明人 YAMADA, MASATO;TAKENAKA, TAKAO;ENDO, MASAHISA
分类号 C30B19/06;H01L21/208 主分类号 C30B19/06
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