发明名称 Mask and charged particle beam exposure method using the mask.
摘要 <p>A transmission mask is used when exposing patterns by a charged particle beam (B1) which passes therethrough. The transmission mask includes a plate, and a plurality of rectangular blocks (4b, 4i) formed on a surface of the plate and having an area approximately equal to a cross sectional area of the charged particle beam irradiated thereon, where the blocks include a first block (4b) in which at least one transmission hole (11) is provided and a second block (4i) in which no transmission hole is provided. The transmission hole (11) of the first block (4b) is partly irradiated by the charged particle beam (B1) when varying the size of the exposing pattern. A single second block (4i) is provided immediately adjacent to at least two first blocks (4b), so that an irradiating position of the charged particle beam can be varied with respect to both the two first blocks from the single second block. &lt;IMAGE&gt;</p>
申请公布号 EP0518783(A1) 申请公布日期 1992.12.16
申请号 EP19920401643 申请日期 1992.06.12
申请人 FUJITSU LIMITED 发明人 YAMAZAKI, SATORU;YASUDA, HIROSHI;SAKAMOTO, KIICHI
分类号 H01L21/027;H01J37/317;H01L21/30 主分类号 H01L21/027
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