发明名称 MANUFACTURE OF ELECTROSTATIC ATTRACTION JIG
摘要 <p>PURPOSE:To provide the production of an electrostatic attraction jig which forms a thin dielectric layer and allows easy production when the shape of an attracting plane is not flat. CONSTITUTION:The prescribed ion is implanted to the surface layer of a member 1 which is made of conductive material and is to be ion-implanted and a dielectric layer 1a is formed on the surface layer of the member 1. An ion of conductive material is implanted to the member 1, which is made of dielectric material and is to be ion-implanted, at a position of the prescribed depth to form an internal electrode. Such method forms a thin dielectric layer 1 of 2mum regardless of the shape of an attracting plane.</p>
申请公布号 JPH04364056(A) 申请公布日期 1992.12.16
申请号 JP19910138786 申请日期 1991.06.11
申请人 SHIMADZU CORP 发明人 NAKANISHI HIROAKI
分类号 C23C14/48;H01L21/50;H01L21/68;H01L21/683 主分类号 C23C14/48
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