PHOTOSENSITIVE COMPOSITION

摘要

Photosensitive compositions comprising a polymer and a photoactive constituent, which are able to be developed with aqueous, alkaline agents exhibit good bleaching properties in the DUV range, whereby the photoactive constituent has good solubility-inhibiting properties and does not evaporate during the drying process, when the photoactive constituent comprises diazo tetronic acid or a diazo tetronic acid derivative of the following structure: <IMAGE> where the residues R are the same or different and signify H, alkyl, cycloalkyl, aryl or a silicon-containing residue.