ALIGNMENT PATTERNS FOR TWO OBJECTS TO BE ALIGNED RELATIVE TO EACH OTHER

摘要

The invention relates to alignment marks for a process for aligning two objects relative to each other by means of an image recognition system wherein the lines are optoelectronically scanned and the obtained brightness values are integrated line-by-line. The advantages of the alignment marks according to the invention reside in that position inaccuracies due to the mutual optical influence of the alignment marks in the optoelectronic evaluation are avoided and furthermore in a high evaluation speed.