| 摘要 |
PURPOSE:To exclude imperfect development of a wafer, by preventing a lot of development mist generated in a development treating cup when developer is spouted, from scattering outside the cup, in a wafer development treating equipment. CONSTITUTION:Two ceiling panels 7, 8 having the respective apertures at different positions are arranged on the upper part of a development treating cup 5 so as to keep a gap. The two ceiling panels 7, 8 are so arranged that apertures do not overlap with each other, and have trap function to prevent development mist generated when developer is spouted from scattering outside the development treating cup 5. |
