| 摘要 |
<p>A method and an apparatus for exposing several different original images onto a light sensitive material like an offset plate or an intaglio plate by means of a laser exposure process, whereby the light sensitive plate (6) is exposed in several stages with a minor part of the light sensitive plate (6) at the time by an exposure method with three cooperating movements of the parts of the apparatus, namely a) a stepwise displacement of an exposure table (5) in a first direction (X-direction), b) a stepwise displacement of a laser unit (3) in a second direction (Y-direction) which is perpendicular to said first direction, and c) a successive displacement in said first or second direction (X- or Y-direction) by a laser gun (13) while sweep exposing the light sensitive material by means of laser light beam whereby the exposure table (5) and the carrier of the laser unit (3) are in fixed positions.</p> |
