发明名称 WAFER ROTATING DEVICE
摘要 <p>PURPOSE:To detect the speed of rotation of a placing stage support pillar in a closed vessel in a state that the sealing performance of the closed vessel is held. CONSTITUTION:A placing stage 3 placed with a wafer 2 and a placing stage support pillar 4 bonded firmly to this placing stage 3 are respectively housed in a closed vessel 1. A magnetic fluid seal 6 couples a motor 7 with the pillar 4 in a noncontact state in a state that the sealing performance of the vessel 1 is held. A through hole 8 is perforated in the pillar 4 and a luminous flux from a light-emitting device 14 passes through the hole 8 via a window 14, transmits a window 12 and is made incicident to a photodetector 15. A detection output of the photodetector 15 shows the speed of rotation of the pillar 4. A control device 16 controls the speed of rotation of the motor 7 on the basis of the detection output so that the speed of rotation of the pillar 4 reaches a desired value.</p>
申请公布号 JPH04355944(A) 申请公布日期 1992.12.09
申请号 JP19910010205 申请日期 1991.01.30
申请人 TOSHIBA CORP;TOSHIBA MICRO ELECTRON KK 发明人 NUNOTANI NOBUHITO;MINOHOSHI TOMIO
分类号 H01L21/66;H01L21/68 主分类号 H01L21/66
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