发明名称 Semiconductor memory device having a memory cell capacitor and a fabrication process thereof.
摘要 <p>A method for fabricating a dynamic random access memory comprises the steps of determining a design rule for word lines (WL, 16) and bit lines (BL, 20) and further for a pattern (AL, 30) that extends from a memory cell array region to a peripheral region across a stepped boundary, determining a step height (H) of the stepped boundary based upon the design rule, determining a capacitance (CS) of the memory cell capacitor based upon the step height of the stepped boundary, determining a parasitic capacitance (CB) of a bit line such that a ratio of the parasitic capacitance to the capacitance of the memory cell is smaller than a predetermined factor, and determining the number (N) of the memory cells that are connected to one bit line based upon the parasitic capacitance of the bit line. &lt;IMAGE&gt;</p>
申请公布号 EP0517255(A2) 申请公布日期 1992.12.09
申请号 EP19920109561 申请日期 1992.06.05
申请人 FUJITSU LIMITED 发明人 EMA, TAIJI
分类号 G11C11/404;G11C11/4097;H01L21/8242;H01L27/10;H01L27/108 主分类号 G11C11/404
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