PLANE POSITION DETECTING DEVICE AND PRODUCTION OF SEMICONDUCTOR DEVICE USING IT

摘要

PURPOSE:To align a whole exposure area on a wafer within the capacity of focus depth of an optical system and produce a high-density semiconductor element by detecting the height information of a plurality of points in the exposure area on the wafer by using a suitably set plane position detecting device. CONSTITUTION:Five measuring points 19-23 on a wafer 2 are irradiated with the pinhole images of almost the same size by a light irradiating means SA and the pinhole images are re-image-formed on the detecting plane 17 of a photoelectric transfer means SC using reflecting light from each measuring point. The incidence position information of the pinhole images made incident on the detecting plane 17 changes according to the height of the plane of the wafer 2. The information is detected by the photoelectric transfer means SC and the photoelectric transfer means SC inputs the incidence position information of the pinholes on the detecting plane 17 to a focus controller 18. The focus controller 18 inputs the inputted height information to a stage controller 4 and the stage controller 4 drives a wafer stage 3 to perform the projection exposure of the pattern of a reticule 1a on the wafer 2.