PROCESS FOR DRYING METAL SURFACES USING GASEOUS HYDRIDES TO INHIBIT MOISTURE ADSORPTION AND FOR REMOVING ADSORBED MOISTURE FROM THE METAL SURFACE

摘要

A process for drying a metal surface to enhance the stability of a gas mixture containing one or more gaseous hydrides in low concentration in contact therewith, which comprises: a) purging gas in contact with said metal surface with inert gas to remove the purged gas, b) exposing the metal surface to an amount of a drying agent comprising an effective amount of gaseous hydride of silicon, germanium, tin or lead, and for a time sufficient to dry the metal surface, and c) purging the drying agent using inert gas.