| 摘要 |
PURPOSE:To provide sufficient antireflection performance and stability by forming multilayered antireflection films on an org. high-polymer substrate and confining the pore size of a high-refractive index layer observed with an interatomic force microscope to a specific value or below. CONSTITUTION:This article is constituted by forming the multilayered antireflection films on the org. high-polymer substrate and the pore size of the high-refractive index layer observed with the interatomic force microscope is <=300Angstrom . The amt. of the residual org. matter in the antireflection layers is preferably <=0.02 molar ratio of the carbon atom to the metal atom. While this org. high-polymer substrate is not particularly limited, the substrate is preferably adequate in optical characteristics, such as transparency, dispersibility, and refractive index, when the substrate is used for optical applications. Polymethyl methacrylate or the polymer thereof, etc., are exemplified as the preferable material of the substrate. The antireflection layers have the film thickness and refractive index preferably within the range of specified conditions in order to exhibit their functions. Namely, the antireflection layers are formed of multiple layers consisting of >=3 layers. |
