| 摘要 |
PURPOSE:To eliminate the need for managing the factor for a shape fluctuation with high accuracy and to allow a required shape to be obtd. only by the correction of a final product by subjecting a stamper obtd. by the conventional method to an etching treatment. CONSTITUTION:The surface of a glass substrate is successively subjected to stages for applying a resist, exposing, developing, conducting treatment and electrocasting and thereafter, the glass substrate is peeled, by which the laminate of the resist layer and the metallic layer is obtd. The surface of the stamper 3 formed by removing the surface resist layer of this laminate is subjected to dry etching or wet etching, by which etched parts 4 of the Ni stamper are formed. Only the width of the patterns can, therefore, be changed without changing the depth and height of the patterns and the shape fluctuation generated during the production process is easily corrected. |
